S/D Contact Solutions to Enable Contact Resistivity <1E-9 for 5nm and Beyond

C. -Y. Chang

2:50 PM - 3:10 PM

[K-4-03] S/D Contact Solutions to Enable Contact Resistivity <1E-9 for 5nm and Beyond

^○C. -Y. Chang¹, F. A. Khaja¹, K. E. Hollar¹, K. V. Rao¹, S. Munnanqi¹, Y. Chen¹, M. Okazaki¹, Y. -C. Huang¹, X. Li¹, H. Chung¹, O. Chan¹, C. Lazik¹, M. Jin¹, H. Zhou¹, A. Mayur¹, R. Hung¹, N. Kim¹ (1.Applied Materials, Inc (USA))

2017 International Conference on Solid State Devices and Materials

[K-4-03] S/D Contact Solutions to Enable Contact Resistivity <1E-9 for 5nm and Beyond