2018 International Conference on Solid State Devices and Materials

Sessions

Oral Presentation

86 results  (11 - 20)

  • Oral Presentation
  • | 02: Advanced / Emerging Memories and New Applications

Wed. Sep 12, 2018 9:00 AM - 10:30 AM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: I. Kataeva (DENSO Corp.), N. Takaura (Hitachi, Ltd.)

  • Oral Presentation
  • | 02: Advanced / Emerging Memories and New Applications

Wed. Sep 12, 2018 10:45 AM - 12:00 PM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: T. Sakamoto (NEC Corp.), Y. Jono (Micron Memory Japan Inc.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 12, 2018 1:30 PM - 3:00 PM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: N. Mise (Hitachi High-Technologies Corp.), M. Kadoshima (Renesas Electronics Corp.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 12, 2018 3:15 PM - 4:30 PM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: H. Itokawa (Toshiba Memory Corp.), N. Planes (STMicroelectronics)

  • Oral Presentation
  • | 02: Advanced / Emerging Memories and New Applications

Thu. Sep 13, 2018 9:00 AM - 10:45 AM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: K. Yamamoto (Toshiba Memory Corp.), Y. Jono (Micron Memory Japan Inc.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Tue. Sep 11, 2018 2:00 PM - 3:15 PM Room 213 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: T. Matsukawa (AIST), H. Arimura (IMEC)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Tue. Sep 11, 2018 3:30 PM - 4:30 PM Room 213 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: G. Nakamura (Tokyo Electron Ltd.), S. Cho (Gachon Univ.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 12, 2018 9:00 AM - 10:30 AM Room 213 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: S. Yoshida (Sony Semiconductor Solutions Corp.), O. Nakatsuka (Nagoya Univ.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 12, 2018 10:45 AM - 12:00 PM Room 213 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: T. Matsukawa (AIST), P. Su (NCTU)