2018 International Conference on Solid State Devices and Materials

Presentation information

Oral Presentation

01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

[B-6] Process Technology

Wed. Sep 12, 2018 3:15 PM - 4:30 PM Room 212 (School of Engineering Bldg.2 North Wing first floor)

Session Chair: H. Itokawa (Toshiba Memory Corp.), N. Planes (STMicroelectronics)

3:15 PM - 3:45 PM

[B-6-01 (Invited)] Atomic Layer Etching - Breaking Through the Limitation of Etch

K. Nojiri1, K.J. Kanarik2, S. Tan2, E.A. Hudson2, R.A. Gottscho2 (1.Lam Res. Co., Ltd. (Japan), 2.Lam Res. Corp. (USA))

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