2019 International Conference on Solid State Devices and Materials

Sessions

Oral Presentation

68 results  (61 - 68)

  • Oral Presentation
  • | Joint Session(Area5&7&SP)

Thu. Sep 5, 2019 1:00 PM - 2:15 PM IB015 (IB 1F)

Session Chair: T. Yoshida (Hiroshima Univ.), N. Nishiyama (Tokyo Tech)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Tue. Sep 3, 2019 2:00 PM - 3:30 PM IB Lecture Hall (IB 2F)

Session Chair: H. Morioka (Socionext Inc.), O. Weber (CEA-Leti)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 4, 2019 9:00 AM - 10:30 AM IB Lecture Hall (IB 2F)

Session Chair: M. Kobayashi (Univ. of Tokyo), N. Mise (Hitachi High-Technologies Corp.)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Wed. Sep 4, 2019 3:30 PM - 4:30 PM IB Lecture Hall (IB 2F)

Session Chair: H. Oishi (Sony Semiconductor Solutions Corp.), F.L. Yang (Academia Sinica)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Thu. Sep 5, 2019 9:00 AM - 10:15 AM IB Lecture Hall (IB 2F)

Session Chair: H. Itokawa (Toshiba Memory Corp.), N. Planes (STMicroelectronics)

  • Oral Presentation
  • | 01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

Thu. Sep 5, 2019 10:30 AM - 12:00 PM IB Lecture Hall (IB 2F)

Session Chair: T. Matsukawa (AIST), S. Cho (Gachon Univ.)