Selective Laser Annealing Technology for LTPS Thin Film Transistors Fabrications

T. Goto

doi:https://doi.org/10.7567/SSDM.2019.G-2-01

3:45 PM - 4:15 PM

[G-2-01 (Invited)] Selective Laser Annealing Technology for LTPS Thin Film Transistors Fabrications

^○T. Goto¹, K. Imokawa², T. Yamada², K. Saito³, J. Gotoh³, H. Ikenoue², S. Sugawa¹ (1.Tohoku Univ. (Japan), 2.Kyushu Univ. (Japan), 3.V Technology Co., Ltd. (Japan))

https://doi.org/10.7567/SSDM.2019.G-2-01

2019 International Conference on Solid State Devices and Materials

[G-2-01 (Invited)] Selective Laser Annealing Technology for LTPS Thin Film Transistors Fabrications