The Japan Society of Applied Physics

10:00 AM - 10:15 AM

[K-5-04] Impact of Post Deposition Annealing on Chemical Bonding Features and Filled Electronic Defects of AlSiO/GaN(0001) Structure

A. Ohta1, D. Kikuta2, T. Narita2, K. Itoh2, K. Makihara1, T. Kachi1, S. Miyazaki1 (1.Nagoya Univ. (Japan), 2.Toyota Central R&D Labs. Inc. (Japan))

https://doi.org/10.7567/SSDM.2019.K-5-04