2019 International Conference on Solid State Devices and Materials

Presentation information

Oral Presentation

01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

[N-5] Process Science and Technology

Thu. Sep 5, 2019 9:00 AM - 10:15 AM IB Lecture Hall (IB 2F)

Session Chair: H. Itokawa (Toshiba Memory Corp.), N. Planes (STMicroelectronics)

9:00 AM - 9:30 AM

[N-5-01 (Invited)] FinFET Extension towards N3 and Beyond – Local Fin Trimming

T. Miyashita1, S. Mittal1, K. Suen1, M.S. Kim1, A. Pal1, A. Sachid1, M. Cogorno1 (1.Applied Materials, Inc. (USA))

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