The Japan Society of Applied Physics

9:30 AM - 9:45 AM

[N-5-02] Surface Modification of SiO2 Thin Film using High-Dose Ion Implantation Technique as a Manufacturing Worthy Process

R. Wada1, H. Kai1, J. Sasaki1, T. Kuroi1, T. Ikejiri1 (1.NISSIN ION EQUIPMENT CO.,LTD. (Japan))

https://doi.org/10.7567/SSDM.2019.N-5-02