9:00 AM - 9:30 AM

[E-4-01 (Invited)] Atomic-layer-deposited atomically thin In2O3 channel for BEOL logic and memory applications

〇Peide D. Ye¹ (1. Purdue Univ. (United States of America))

Presentation style: Online

https://doi.org/10.7567/SSDM.2022.E-4-01