14:00 〜 14:15
Toshitsugu Sakamoto1, Makoto Miyamura1, ○Kazunori Funahashi1, Munehiro Tada1, Ken Uchida2, Hiroki Ishikuro3 (1. NanoBridge Semiconductor, Inc. (Japan), 2. Univ. of Tokyo (Japan), 3. Keio Univ. (Japan))
Oral Presentation
01: Advanced CMOS: Material Science / Process Engineering / Device Technology
2023年9月6日(水) 14:00 〜 15:45 Room F (224, Bldg. 2)
Session Chairs: Satofumi Souma (Kobe Univ.), Hidetoshi Oishi (Sony Semiconductor Solutions Corp.)
14:00 〜 14:15
Toshitsugu Sakamoto1, Makoto Miyamura1, ○Kazunori Funahashi1, Munehiro Tada1, Ken Uchida2, Hiroki Ishikuro3 (1. NanoBridge Semiconductor, Inc. (Japan), 2. Univ. of Tokyo (Japan), 3. Keio Univ. (Japan))
14:15 〜 14:30
○Pierre EYBEN1, Pierre De Keersgieter1, Philippe Matagne1, Thomas Chiarella1, Clément Porret1, Andriy Hikavyy1, Yong Kong Siew1, Ludovic Goux1, Jérôme Mitard1, Naoto Horiguchi1 (1. Imec (Belgium))
14:30 〜 14:45
○Camila Cavalcante1, H. Arimura1, Y. Oniki1, F. Sebaai1, E. Capogreco1, L-A. Ragnarsson1, B.T. Chan1, A. Hikavyy1, H. Mertens1, K. Vandersmissen1, E. Dentoni Litta1, S. Subramanian1, S. Biesemans1, N. Horiguchi1 (1. imec (Belgium))
14:45 〜 15:00
○Luping Wang1, Junkang Li1, Rui Zhang1 (1. Zhejiang Univ. (China))
15:00 〜 15:15
○Xinze Li1, Sebastien Loubriat2, Guillaume Besnard3, Christophe Maleville3, Olivier Weber4, Ran Cheng1 (1. Zhejiang Univ. (China), 2. CEA-LETI Corp. (France), 3. SOITEC Corp. (France), 4. STMicroelectronics Corp. (France))
15:15 〜 15:30
○Jinghan Xu1, Mengqi Fan1, Zixuan Sun1, Fei Liu1, Xiaoyan Liu1 (1. Peking University (China))
15:30 〜 15:45
○Junichi Hattori1, Koichi Fukuda1, Tsutomu Ikegami1, Yoshihiro Hayashi1 (1. AIST (Japan))
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