[H-1] Advanced Materials for Photonics

2023年9月6日(水) 14:00 〜 14:45 Room H (232, Bldg. 2)

Session Chairs: Xuejun Xu (Nippon Telegraph and Telephone Corp.), Satoshi Iwamoto (Univ. of Tokyo)

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14:00 〜 14:15

[H-1-01] Optical Amplification in SiN Half-Etch Horizontal Slot Waveguides Incorporating Al2O3:Er Layer

^○Eva Kempf^1,2, Sébastien Cueff², Jimmy John², Arnaud Taute^1,2, Ali Belarouci², Stéphane Monfray¹, Frédéric Boeuf¹, Paul G. Charette³, Régis Orobtchouk² (1. STMicroelectronics (France), 2. Univ. of Lyon (France), 3. Univ. of Sherbrooke (Canada))

14:15 〜 14:30

[H-1-02] Optical Detection of Trace Amounts of Er Ions in Silicon-based Rare Earth Oxide Thin Film Waveguides

^○Shoichiro Yasui^1,2, Tomohiro Inaba¹, Kenichi Hitachi¹, Atsushi Ishizawa³, Reina Kaji², Takehiko Tawara⁴, Satoru Adachi², Xuejun Xu¹, Haruki Sanada¹ (1. NTT Basic Res. Lab., NTT Corp. (Japan), 2. Graduate School of Eng., Hokkaido Univ. (Japan), 3. College of Indus. Tech., Nihon Univ. (Japan), 4. College of Eng., Nihon Univ. (Japan))

14:30 〜 14:45

[H-1-03] Visualization of THz electromagnetic near field distributions using highly sensitive polarization CMOS image sensor

^○Ryoma Okada^1,2, Maya Mizuno², Tomoaki Nagaoka², Hironari Takehara¹, Makito Haruta^1,3, Hiroyuki Tashiro^1,4, Jun Ohta¹, Kiyotaka Sasagawa^1,2 (1. Nara Institute of Science Technolgy (Japan), 2. National Institute of Information and Communications Technology (Japan), 3. Chitose Institute of Science and Technology (Japan), 4. Kyushu Univ. (Japan))