2023 International Conference on Solid State Devices and Materials

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10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

7件中 (1 - 7)

  • Oral Presentation
  • | 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[C-3] Advanced process of oxide semiconductors

2023年9月7日(木) 09:00 〜 10:15 Room C (221, Bldg. 2)

Session Chairs: Keisuke Ide (Tokyo Tech), Kaoru Toko (Univ. of Tsukuba)

  • Oral Presentation
  • | 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-5] Oxide semiconductor TFTs and technology

2023年9月8日(金) 09:00 〜 10:15 Room E (223, Bldg. 2)

Session Chairs: Juan Paolo Bermundo (NAIST), Jun Koyama (Semiconductor Energy Lab.)

  • Oral Presentation
  • | 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-6] Thin films for sensors and gate insulators

2023年9月8日(金) 10:45 〜 12:00 Room E (223, Bldg. 2)

Session Chairs: Mamoru Furuta (Kochi Univ. of Technology), Chih-Yu Chang (TSMC)

  • Oral Presentation
  • | 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-7] Advanced LTPS TFTs and related technologies

2023年9月8日(金) 13:45 〜 15:00 Room E (223, Bldg. 2)

Session Chairs: Shin-ichiro Kuroki (Hiroshima Univ.), Wenchang Yeh (Shimane Univ.)

  • Oral Presentation
  • | 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-8] Group IV cyrstal growth and applications

2023年9月8日(金) 15:30 〜 16:15 Room E (223, Bldg. 2)

Session Chairs: Kenta Moto (Kyushu Univ.), Toshiya Murakami (KIOXIA)