Demonstration of Cavity Capacitor for Advanced Nanosheet Gate Stack Study

Camila Cavalcante

doi:https://doi.org/10.7567/SSDM.2023.F-1-03

Presentation information

Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-1] Modeling, Simulation and Characterization

Wed. Sep 6, 2023 2:00 PM - 3:45 PM Room F (224, Bldg. 2)

Session Chairs: Satofumi Souma (Kobe Univ.), Hidetoshi Oishi (Sony Semiconductor Solutions Corp.)

2:30 PM - 2:45 PM

[F-1-03] Demonstration of Cavity Capacitor for Advanced Nanosheet Gate Stack Study

^○Camila Cavalcante¹, H. Arimura¹, Y. Oniki¹, F. Sebaai¹, E. Capogreco¹, L-A. Ragnarsson¹, B.T. Chan¹, A. Hikavyy¹, H. Mertens¹, K. Vandersmissen¹, E. Dentoni Litta¹, S. Subramanian¹, S. Biesemans¹, N. Horiguchi¹ (1. imec (Belgium))

https://doi.org/10.7567/SSDM.2023.F-1-03

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Presentation information

[F-1] Modeling, Simulation and Characterization

[F-1-03] Demonstration of Cavity Capacitor for Advanced Nanosheet Gate Stack Study

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