2023 International Conference on Solid State Devices and Materials

講演情報

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Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-4] Innovative Devices and Sensing Technology

2023年9月7日(木) 10:45 〜 11:45 Room F (224, Bldg. 2)

Session Chairs: Hidetoshi Oishi (Sony Semiconductor Solutions Corp.), Nobuyuki Mise (Hitachi High-Tech Corp.)

11:15 〜 11:30

[F-4-03] Experimental observation of negative differential resistance in GeSn/GeSiSn double barrier structure toward resonant tunneling diode applications

○Shuto Ishimoto1, Mitsuo Sakashita1, Masashi Kurosawa1, Osamu Nakatsuka1, Shigehisa Shibayama1 (1. Nagoya Univ. (Japan))

https://doi.org/10.7567/SSDM.2023.F-4-03

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