Low Temperature Selective Growth of Group-IV Source / Drain Epilayers for Advanced Contact Applications

Clement Porret

doi:https://doi.org/10.7567/SSDM.2023.F-5-01

9:00 AM - 9:30 AM

[F-5-01 (Invited)] Low Temperature Selective Growth of Group-IV Source / Drain Epilayers for Advanced Contact Applications

^○Clement Porret¹, Andriy Y. Hikavyy¹, Erik Rosseel¹, Pierre Eyben¹, Gerardo T. Martinez¹, Jean-Luc Everaert¹, Gianluca Rengo^1,2,3, Bert Pollefliet^1,2, Yosuke Shimura¹, Robert Langer¹, Naoto Horiguchi¹, Roger Loo¹ (1. imec (Belgium), 2. FWO (Belgium), 3. KU Leuven (Belgium))

https://doi.org/10.7567/SSDM.2023.F-5-01

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Presentation information

[F-5] Advanced CMOS: Process Technology

[F-5-01 (Invited)] Low Temperature Selective Growth of Group-IV Source / Drain Epilayers for Advanced Contact Applications

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