Epitaxial SiGe/Si Multi-Stacks for CFET Devices

Roger Loo

doi:https://doi.org/10.7567/SSDM.2023.F-5-03

講演情報

Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-5] Advanced CMOS: Process Technology

2023年9月8日(金) 09:00 〜 10:15 Room F (224, Bldg. 2)

Session Chairs: Genji Nakamura (Tokyo Electron Ltd.), Takashi Matsukawa (AIST)

09:45 〜 10:00

[F-5-03] Epitaxial SiGe/Si Multi-Stacks for CFET Devices

^○Roger Loo¹, Yosuke Shimura¹, Anjani Akula¹, Clement Porret¹, Alex Merkulov¹, Mustafa Ayyad¹, Han Han¹, Olivier Richard¹, Andrea Impagnatiello¹, Andriy Hikavyy¹ (1. Imec (Belgium))

https://doi.org/10.7567/SSDM.2023.F-5-03

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講演情報

[F-5] Advanced CMOS: Process Technology

[F-5-03] Epitaxial SiGe/Si Multi-Stacks for CFET Devices

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