Formation of b–FeSi <sub>2</sub> NDs by SiH <sub>4</sub>–Exposure to Fe–NDs

Haruto Saito

doi:https://doi.org/10.7567/SSDM.2023.M-7-02

講演情報

Oral Presentation

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

2023年9月8日(金) 13:30 〜 15:15 Room M (431, Bldg. 4)

Session Chairs: Akihiko Kikuchi (Sophia Univ.), Kentaro Watanabe (Shinshu Univ.)

13:45 〜 14:00

[M-7-02] Formation of b–FeSi ₂ NDs by SiH ₄–Exposure to Fe–NDs

^○Haruto Saito¹, Katsunori Makihara¹, Noriyuki Taoka², Seiichi Miyazaki¹ (1. Nagoya Univ. (Japan), 2. Aichi Institute of Tech. (Japan))

https://doi.org/10.7567/SSDM.2023.M-7-02

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講演情報

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

[M-7-02] Formation of b–FeSi 2 NDs by SiH 4–Exposure to Fe–NDs

パスワード

[M-7-02] Formation of b–FeSi ₂ NDs by SiH ₄–Exposure to Fe–NDs