Significant Difference in Ferroelectric Phase Formation Kinetics in Post-deposition and Post-metallization Annealing of HZO Films

Tianning - Cui

doi:https://doi.org/10.7567/SSDM.2023.M-7-07

Presentation information

Oral Presentation

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

Fri. Sep 8, 2023 1:30 PM - 3:15 PM Room M (431, Bldg. 4)

Session Chairs: Akihiko Kikuchi (Sophia Univ.), Kentaro Watanabe (Shinshu Univ.)

3:00 PM - 3:15 PM

[M-7-07 (Late News)] Significant Difference in Ferroelectric Phase Formation Kinetics in Post-deposition and Post-metallization Annealing of HZO Films

^○Tianning - Cui¹, Zhipeng - Xue¹, Danyang - Chen¹, Yuyan - Fan¹, Jingquan - Liu¹, Xiuyan - Li¹ (1. Shanghai Jiao Tong University (China))

https://doi.org/10.7567/SSDM.2023.M-7-07

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Presentation information

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

[M-7-07 (Late News)] Significant Difference in Ferroelectric Phase Formation Kinetics in Post-deposition and Post-metallization Annealing of HZO Films

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