Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

Shinji Migita

doi:https://doi.org/10.7567/SSDM.2023.PS-1-07

Presentation information

Poster Session

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[PS-1] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

Thu. Sep 7, 2023 3:00 PM - 5:00 PM Shirotori Hall (Nagoya Congress Center)

[PS-1-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties

^○Shinji Migita¹, Shutaro Asanuma¹, Yukinori Morita¹, Hiroyuki Ota¹ (1. AIST (Japan))

https://doi.org/10.7567/SSDM.2023.PS-1-07

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Presentation information

[PS-1] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[PS-1-07] Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

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[PS-1-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties