Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

Ren Aoki

doi:https://doi.org/10.7567/SSDM.2023.PS-11-09

講演情報

Poster Session

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

2023年9月7日(木) 15:00 〜 17:00 Shirotori Hall (Nagoya Congress Center)

[PS-11-09] Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

^○Ren Aoki¹, Keita Katayama¹, Daisuke Nakamura¹, Hisato Yabuta¹, Hiroshi Ikenoue¹, Taizoh Sadoh¹ (1. Kyushu Univ. (Japan))

https://doi.org/10.7567/SSDM.2023.PS-11-09

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講演情報

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11-09] Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

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