Local strain distribution analysis in strained SiGe spintronics devices

Tomoki Onabe

doi:https://doi.org/10.7567/SSDM.2023.PS-11-13

講演情報

Poster Session

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

2023年9月7日(木) 15:00 〜 17:00 Shirotori Hall (Nagoya Congress Center)

[PS-11-13] Local strain distribution analysis in strained SiGe spintronics devices

^○Tomoki Onabe¹, Zhendong Wu¹, Tetsuya Tohei¹, Yusuke Hayashi¹, Kazushi Sumitani², Yasuhiko Imai², Shigeru Kimura², Takahiro Naito¹, Kohei Hamaya¹, Akira Sakai¹ (1. Osaka Univ. (Japan), 2. JASRI (Japan))

https://doi.org/10.7567/SSDM.2023.PS-11-13

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講演情報

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11-13] Local strain distribution analysis in strained SiGe spintronics devices

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