Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

Shinji Migita

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Short Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[SO-PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

Thu. Sep 7, 2023 1:30 PM - 2:00 PM Room F (224, Bldg. 2)

Session Chairs: Hidetoshi Oishi (Sony Semiconductor Solutions Corp.), Keisuke Yamamoto (Kyushu Univ)

1:42 PM - 1:44 PM

[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties

^○Shinji Migita¹, Shutaro Asanuma¹, Yukinori Morita¹, Hiroyuki Ota¹ (1. AIST (Japan))

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Presentation information

[SO-PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

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[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties