[SO-PS-02] 02: Advanced and Emerging Memories / New Applications

[SO-PS-02-04] Remnant Polarization Enhancement in Ferroelectric HfO₂ Thin Films Induced by Mechanical Uniaxial Tensile Strain during Polarization Switching

^○Tatsuya Inoue¹, Takashi Onaya², Koji Kita^1,2 (1. Dept. of Materials Engineering, The Univ. of Tokyo (Japan), 2. Dept. of Advanced Materials Science, The Univ. of Tokyo (Japan))