Remnant Polarization Enhancement in Ferroelectric HfO<sub>2</sub> Thin Films Induced by Mechanical Uniaxial Tensile Strain during Polarization Switching

Tatsuya Inoue

講演情報

Short Oral Presentation

02: Advanced and Emerging Memories / New Applications

[SO-PS-02] 02: Advanced and Emerging Memories / New Applications

2023年9月7日(木) 13:30 〜 14:18 Room K (234, Bldg. 2)

Session Chairs: Atsushi Himeno (Panasonic Holdings Corporation), Ming-Hsiu Lee (Macronix International Co., Ltd)

13:36 〜 13:38

[SO-PS-02-04] Remnant Polarization Enhancement in Ferroelectric HfO₂ Thin Films Induced by Mechanical Uniaxial Tensile Strain during Polarization Switching

^○Tatsuya Inoue¹, Takashi Onaya², Koji Kita^1,2 (1. Dept. of Materials Engineering, The Univ. of Tokyo (Japan), 2. Dept. of Advanced Materials Science, The Univ. of Tokyo (Japan))

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講演情報

[SO-PS-02] 02: Advanced and Emerging Memories / New Applications

[SO-PS-02-04] Remnant Polarization Enhancement in Ferroelectric HfO2 Thin Films Induced by Mechanical Uniaxial Tensile Strain during Polarization Switching

パスワード

[SO-PS-02-04] Remnant Polarization Enhancement in Ferroelectric HfO₂ Thin Films Induced by Mechanical Uniaxial Tensile Strain during Polarization Switching