[T4] Hot Isostatic Pressing

[17C-T4-01] Process Exploration of Preparing Large-Sized Uniformly Composed Mo Alloy Sputtering Target via Hot Isostatic Pressing

*Z. Wu¹, L. Che¹, P. Tang¹, J. He¹, Z. Lv¹, X. Li¹ (1.CISRI HIPEX Technology Co., Ltd., China)

キーワード：Hot isostatic pressing, large-sized sputtering target, density, powder metallurgy

Mo alloy sputtering target samples were prepared using Mo powder, Ni powder, Ti powder and Ni-Ti alloy powder as raw materials by hot isostatic pressing. Density, phase composition, microstructure and element distribution of Mo-Ti, Mo-Ni-Ti sputtered target samples were measured by OM, SEM and EDS. The experimental results show that hot isostatic pressing can prepare large-sized Mo alloy target at lower temperature, and the obtained samples have finer grains, higher density and more uniform element distribution than that of non-pressure sintering. Mo-Ti, Mo-Ni-Ti sputtering targets (Purity>99.95%, density>99%, particle size<100 μm, component deviation<2 wt%) were obtained by hot isostatic pressing.