[T4] Hot Isostatic Pressing

[17C-T4-01] Process Exploration of Preparing Large-Sized Uniformly Composed Mo Alloy Sputtering Target via Hot Isostatic Pressing

*Z. Wu¹, L. Che¹, P. Tang¹, J. He¹, Z. Lv¹, X. Li¹ (1.CISRI HIPEX Technology Co., Ltd., China)

キーワード：Hot isostatic pressing, sputtering target, density, powder metallurgy

Mo-Ni-Ti alloy sputtering target samples were prepared using Mo powder and Ni-Ti alloy powder as raw materials by hot isostatic pressing. Density, phase composition, microstructure and element distribution of Mo-Ni-Ti sputtered target samples were measured by OM, SEM and EDS. The experimental results show that hot isostatic pressing can prepare Mo alloy target at lower temperature, and the obtained samples have finer grains, higher density, higher bending strength and more uniform element distribution than that of non-pressure sintering. In this work, Mo-Ni-Ti sputtering targets (Purity>99.95%, density>99.5%, particle size<100 μm, component deviation<0.5 wt%) were obtained by hot isostatic pressing.