International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

15:45 〜 16:10

[AMD2-2(Invited)] 5291 ppi OLED Display with C-Axis Aligned Crystalline Oxide Semiconductor

*Shuichi Katsui1, Hidetomo Kobayashi1, Takashi Nakagawa1, Yuki Tamatsukuri1, Hideaki Shishido1, Shogo Uesaka1, Ryohei Yamaoka1, Takaaki Nagata1, Tomoya Aoyama1, Yutaka Okazaki1, Takayuki Ikeda1, Shunpei Yamazaki1 (1. Semiconductor Energy Laboratory Co., Ltd. (Japan))

IGZO, VR, OLED, High resolution, Micro display

https://doi.org/10.36463/idw.2019.0409

C-axis aligned crystalline oxide semiconductor field-effect transistor (CAAC-OS FET) can be scaled down to a width and length of 60 nm. We have fabricated an organic light-emitting diode (OLED) display with more than 5000 ppi required in virtual reality (VR) displays by using CAAC-OS FETs as the backplane.