Improving Performances of Oxide Phototransistors Using a Mechano-Chemically Treated Porous Structure as The Visible Light Absorption Layer

I Sak Lee

doi:https://doi.org/10.36463/idw.2019.0447

10:05 〜 10:20

[AMD4-5L] Improving Performances of Oxide Phototransistors Using a Mechano-Chemically Treated Porous Structure as The Visible Light Absorption Layer

*I Sak Lee¹, Bennet Nii Akwei Brown², Dongwoo Kim¹, Sujin Jung¹, Byung Ha Kang¹, Hyun Jae Kim¹ (1. Yonsei University (Korea), 2. Columbia University (United States of America))

Oxide TFT, Photosensor, Visible light, Mechano-chemical treatment

https://doi.org/10.36463/idw.2019.0447

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Proceedings of the International Display Workshops Volume 26 (IDW '19)

[AMD4-5L] Improving Performances of Oxide Phototransistors Using a Mechano-Chemically Treated Porous Structure as The Visible Light Absorption Layer

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