International Display Workshops Incorporated Association

10:10 AM - 10:30 AM

[AMD5-4] Simulation Study of Self-Heating and Edge Effects on Oxide-Semiconductor TFTs: Channel-Width Dependence

*Katsumi Abe1, Kazuki Ota1, Takeshi Kuwagaki1 (1. Silvaco Japan Co., Ltd. (Japan))

Oxide-semiconductor, Thin-film transistor, Self-heating, Edge effect, Device simulation

https://doi.org/10.36463/idw.2019.0461

We studied the channel-width dependence of oxide-semiconductor TFTs via a device simulator. The results show that the ON-current is affected by two factors: self-heating and edge effects. The former increases the current with a rise in temperature, while the latter produces the high edge current-density caused by its strong electric-field.