International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

10:40 〜 13:10

[AMDp1-21L] Improved Mobility and Stability of Indium-free Oxide Thin Film Transistor by Metal Capping Layer

*Ji-Min Park1, Ho-Hyun Nahm2, Hyun-Suk Kim1 (1. Chungnam National University (Korea), 2. Korea Advanced Institute of Science and Technology (Korea))

thin film transistors, amorphous oxide semiconductors, BaSnO3, high mobility, stability

https://doi.org/10.36463/idw.2019.0563

In this work, to get better electrical properties, metal capping layer and lift-off lithography process of a new type of Indium-free amorphous thin films and associated thin-film transistors (TFTs) were investigated. As a result, optimized TFTs showed high mobility (>30cm2/Vs) and excellent stability than conventional InZnO TFTs.