16:00 〜 16:20

[FMC8-4] Photosensitive Materials with Zirconia Nanotechnology

*Hiroki Chisaka¹, Kouichi Misumi¹, Dai Shiota¹, Katsumi Ohmori¹, Lei Zheng², Robert J. Wiacek², Z. Serpil Gonen Williams² (1. Tokyo Ohka Kogyo Co., Ltd. (Japan), 2. Pixelligent Technologies LLC (United States of America))

High reflective index (HRI), Zirconia (ZrO2), Flexible, Photo-patternenable, Inkjet

https://doi.org/10.36463/idw.2019.0679