International Display Workshops General Incorporated Association

10:40 AM - 1:10 PM

[FMCp3-5] Post-oven Induced Surface Hydrophobicity Degradation of CF4 Plasma Treated Polyimide Photo Resistance

*Letao Zhang1,2, Xiaoliang Zhou2, Peng Zhang1, Yingchun Fan1, Qiankun Xu1, Liangfen Zhang1, Xiaoxing Zhang1, Yuan Jun Hsu1, Shengdong Zhang2 (1. Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (China), 2. Peking University (China))

polyimide film, hydrophobicity, plasma treatment, bank, post-oven

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