10:40 〜 13:10

[FMCp3-5] Post-oven Induced Surface Hydrophobicity Degradation of CF₄ Plasma Treated Polyimide Photo Resistance

*Letao Zhang^1,2, Xiaoliang Zhou², Peng Zhang¹, Yingchun Fan¹, Qiankun Xu¹, Liangfen Zhang¹, Xiaoxing Zhang¹, Yuan Jun Hsu¹, Shengdong Zhang² (1. Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (China), 2. Peking University (China))

polyimide film, hydrophobicity, plasma treatment, bank, post-oven