High Resolution Technologies of 1.0 µm L/S Using PSM Specialized in DUV Broadband Illumination

10:40 AM - 1:10 PM

[FMCp3-6] High Resolution Technologies of 1.0 µm L/S Using PSM Specialized in DUV Broadband Illumination

*Kanji Suzuki¹, Manabu Hakko¹, Miwako Ando¹, Koichi Takasaki¹, Nobuhiko Yabu¹, Kouhei Nagano¹, Nozomu Izumi¹ (1. Canon Inc. (Japan))

Lithography, FPD, High resolution, DUV, Phase shift mask

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