2:30 PM - 5:00 PM
[FMCp5-8L] Capacitance-Voltage Characteristics of Solution-Based HfZr-Silicate Gate Dielectrics
HfZr-Silicate, High-k dielectrics, MOS, Solution process
In this study, Al/(HfZrO4)1-x(SiO2)x/p-Si capacitors were fabricated and evaluated as a function of SiO2 content in the films. From the result, electrical properties enhanced such as oxide charge and breakdown voltage as the SiO2 concentration x increased and reliability improved as well.