International Display Workshops General Incorporated Association

09:30 〜 09:50

[MEET1-2] Electron Beam Lithography of PMMA Film Using Direct Growth CNT Cold Cathode Emitter

*Ok Jung Hwang1, Ha Rim Lee1, Kyu Chang Park1 (1. University of Kyunghee (Korea))

carbon nanotube (CNT), electron beam(e-beam) lithography, VACNTs

https://doi.org/10.36463/idw.2019.1431

We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned carbon nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 um without electric and magnetic lens. This cold cathode emitter is differentiated from the previous electron source for e-beam lithography.