International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

16:20 〜 16:40

[OLED2-4] Ellipsometry, XRR, and GCIB-TOF-SIMS Analysis of Small Molecule Layers in Solution Process and Vacuum Deposition Process

*Takahiro Shibamori1, Sachiko Kojima1, Aki Suzuki1, Yusaku Tanahashi1, Takashi Miyamoto1 (1. Toray Research Center, Inc. (Japan))

solution process, deposition process, organic light emitting diodes, time-of-flight secondary ion mass spectrometry, gas cluster ion beam

https://doi.org/10.36463/idw.2019.0829

Ellipsometry, XRR, and GCIB-TOF-SIMS are applied to investigation of the spin-coating process as comparison of spin-coated samples and vacuum evaporated samples. The residual solvent of spin-coating process was observed in spin-coated samples by GCIB-TOF-SIMS. The result suggested that it can cause the decrease of refractive index observed in ellipsometry.