International Display Workshops Incorporated Association

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[AMDp1-23L] Contact Properties between Low-Resistive Al-Based Source/Drain and InOx in Top-Gate Bottom-Contact Oxide Thin-Film Transistor for Application to the Vertical-TFT

*Sori Jeon1, Kwang-Heum Lee1, Seung-Hee Lee1, Chi-Sun Hwang2, Sang-Hee Ko Park1 (1. Korea Advanced Institute of Science and Technology (KAIST) (Korea), 2. Electronics and Telecommunications Research Institute (ETRI) (Korea))

Proceedings of the International Display Workshops Volume 26 (IDW '19) |Thu. Nov 28, 2019 10:40 AM - 1:10 PM |PDF Download

517 results (151 - 160)