Current Status on the n/p type oxide semiconductor materials and the associated devices using Atomic Layer Deposition.

10:40 〜 11:05

[AMD1-1(Invited)] Current Status on the n/p type oxide semiconductor materials and the associated devices using Atomic Layer Deposition.

*Jin-Seong Park¹, TaeHyun Hong¹, Wanho Choi¹, Kyungrok Kim¹, Hyemi Kim¹, Su Hwan Choi¹ (1. Hanyang Univ. (Korea))

Atomic Layer Deposition, Oxide Semiconductor, Thin Film Transistor, n-type, p-type

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