Development of Wet Fabrication Process of Organic Transistor for High Productivity

Shohei Koizumi

doi:https://doi.org/10.36463/idw.2020.0155

13:25 〜 13:50

[AMD2-2(Invited)] Development of Wet Fabrication Process of Organic Transistor for High Productivity

*Shohei Koizumi¹, Kentaro Yamada¹, Masakazu Hori¹, Yosuke Hayashida¹, Kazuo Naito¹, Seiji Kawabata¹, Yudai Ishigaki¹, Makoto Nakazumi¹, Yoshiaki Kito¹, Hiroaki Iino², Jun-ichi Hanna² (1. Nikon (Japan), 2. Tokyo Institute of Technology (Japan))

Organic transistor, Wet process, Electroless plating, Exposure system, High productivity

https://doi.org/10.36463/idw.2020.0155

We have succeeded in fabrication of an organic transistor (OTFT) circuit on large area substrate by wet process. This time, we have succeeded in finding that high productivity and good TFT characteristics can be achieved at the same time by using a liquid crystalline material as the organic semiconductor material.

Proceedings of the International Display Workshops Volume 27 (IDW '20)

[AMD2-2(Invited)] Development of Wet Fabrication Process of Organic Transistor for High Productivity