Development of Wet Fabrication Process of Organic Transistor for High Productivity

Shohei Koizumi

doi:https://doi.org/10.36463/idw.2020.0155

13:25 〜 13:50

[AMD2-2(Invited)] Development of Wet Fabrication Process of Organic Transistor for High Productivity

*Shohei Koizumi¹, Kentaro Yamada¹, Masakazu Hori¹, Yosuke Hayashida¹, Kazuo Naito¹, Seiji Kawabata¹, Yudai Ishigaki¹, Makoto Nakazumi¹, Yoshiaki Kito¹, Hiroaki Iino², Jun-ichi Hanna² (1. Nikon (Japan), 2. Tokyo Institute of Technology (Japan))

Organic transistor, Wet process, Electroless plating, Exposure system, High productivity

https://doi.org/10.36463/idw.2020.0155

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Proceedings of the International Display Workshops Volume 27 (IDW '20)

[AMD2-2(Invited)] Development of Wet Fabrication Process of Organic Transistor for High Productivity

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