International Display Workshops General Incorporated Association

15:50 〜 16:10

[FLX2-3] High Temperature Tolerant Barrier Film with Stacking Barrier Layers by Sputtering and ALD

*Mitsuhiro Koden1, Toshinao Yuki1, Takahiro Nishikawa2, Miho Sugimoto1, Hitoshi Nakada1 (1. Yamagata University(Japan), 2. KURABO INDUSTRIES LTD.(Japan))

Barrier film, OLED, Flexible, ALD, Sputtering

https://doi.org/10.36463/idw.2020.0891

High gas barrier layers were developed by alternated depositions of Si3N4 layer by sputtering and Al2O3 layer by ALD on simultaneously biaxially stretched polyetheretherketone (PEEK) film with high temperature tolerance.

The developed stacking layers with Si3N4 and Al2O3 achieved high gas barrier ability with WVTR of the order of 10-5g/m2/day.