3:50 PM - 4:10 PM
[FLX2-3] High Temperature Tolerant Barrier Film with Stacking Barrier Layers by Sputtering and ALD
Barrier film, OLED, Flexible, ALD, Sputtering
High gas barrier layers were developed by alternated depositions of Si3N4 layer by sputtering and Al2O3 layer by ALD on simultaneously biaxially stretched polyetheretherketone (PEEK) film with high temperature tolerance.
The developed stacking layers with Si3N4 and Al2O3 achieved high gas barrier ability with WVTR of the order of 10-5g/m2/day.
The developed stacking layers with Si3N4 and Al2O3 achieved high gas barrier ability with WVTR of the order of 10-5g/m2/day.