15:50 〜 16:10

[FLX2-3] High Temperature Tolerant Barrier Film with Stacking Barrier Layers by Sputtering and ALD

*Mitsuhiro Koden¹, Toshinao Yuki¹, Takahiro Nishikawa², Miho Sugimoto¹, Hitoshi Nakada¹ (1. Yamagata University(Japan), 2. KURABO INDUSTRIES LTD.(Japan))

Barrier film, OLED, Flexible, ALD, Sputtering

https://doi.org/10.36463/idw.2020.0891