A New Broadband Illumination Technique to Achieve 1.0 µm L/S Resolution in FPD Lithography

Kanji Suzuki

doi:https://doi.org/10.36463/idw.2020.0228

16:40 〜 17:00

[FMC1-1] A New Broadband Illumination Technique to Achieve 1.0 µm L/S Resolution in FPD Lithography

*Kanji Suzuki¹, Manabu Hakko¹, Miwako Ando¹, Nobuhiko Yabu¹, Kouhei Nagano¹, Nozomu Izumi¹ (1. Canon Inc.(Japan))

Lithography, FPD, High resolution, DUV, RET

https://doi.org/10.36463/idw.2020.0228

To meet the demand for high resolution, we developed a new resolution enhancement technique (RET) and evaluated resolution performance of our new RET with a PSM. It was demonstrated that the newly developed RET improves not only resolution, but also DOF, for 1.0 μm L/S patterns

Proceedings of the International Display Workshops Volume 27 (IDW '20)

[FMC1-1] A New Broadband Illumination Technique to Achieve 1.0 µm L/S Resolution in FPD Lithography