Single Crystallization Technology for Silicon Thin Films Transistor by Optical Fiber and Blue Laser Diode

Junichi Kosugi

doi:https://doi.org/10.36463/idw.2020.0236

17:20 〜 17:40

[FMC1-3] Single Crystallization Technology for Silicon Thin Films Transistor by Optical Fiber and Blue Laser Diode

*Junichi Kosugi¹, Masahiro Kinoshita¹, Seiya Toriyama¹, Takayuki Kosuge¹, Kaori Saito¹, Takuya Sawai¹, Yang YINGBAO¹, Nobuo Sasaki¹, Jun Gotoh¹, Shigeto Sugimoto¹ (1. V Technology Co., Ltd.(Japan))

Optical Fiber, Blue Laser Diode, Low-Temperature Poly-Si, TFT

https://doi.org/10.36463/idw.2020.0236

We propose the single crystallization technology using optical rectangle core fiber and blue laser diode. This simple optical system which forms top-hat-shaped beam projected from the rectangle core can perform single crystallization of Si film by choosing appropriate core shape, optical power and exposure time.

Proceedings of the International Display Workshops Volume 27 (IDW '20)

[FMC1-3] Single Crystallization Technology for Silicon Thin Films Transistor by Optical Fiber and Blue Laser Diode