3,000 ppi Full-Color “Silicon Display” with Monolithic Micro-LED and Color Conversion Technology

Kei Urakawa

doi:https://doi.org/10.36463/idw.2020.0273

15:55 〜 16:10

[FMC4-5L] 3,000 ppi Full-Color “Silicon Display” with Monolithic Micro-LED and Color Conversion Technology

*Kei Urakawa¹, Hiroaki Onuma¹, Masumi Maegawa¹, Kentaro Kubota¹, Shotaro Oie¹, Daiki Hatakeyama¹, Shigeyuki Akase¹, Yuta Ikawa¹, Shinji Yamaguchi¹, Naoto Momotani¹, Kyohei Mikami¹, Yusuke Fujita¹, Hiroshi Yamashita¹, Toshiya Ishio¹, Shin Itoh¹, Narakazu Shimomura¹, Shinsuke Anzai¹, Hidenori Kawanishi¹ (1. Sharp Fukuyama Semiconductor Co.,Ltd.(Japan))

Microdisplay, Monolithic micro LED, Color conversion, Light shielding wall, Cadmium-free quantum dot

https://doi.org/10.36463/idw.2020.0273

3,000 ppi full-color “Silicon Display” has successfully been demonstrated based on monolithic micro-LED and Cd-free quantum dot (QD) color conversion technology. “Light-shielding wall (LSW)” is the key to prevent optical cross-talk. The demonstrator with 8.4um square pixel including RGB sub-pixels has shown wide color gamut exceeding 111% of sRGB.

Proceedings of the International Display Workshops Volume 27 (IDW '20)

[FMC4-5L] 3,000 ppi Full-Color “Silicon Display” with Monolithic Micro-LED and Color Conversion Technology