International Display Workshops General Incorporated Association

16:10 〜 18:10

[FMCp2-1] Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR

*Jiro Hikida1, Hiroki Chisaka1, Yoichiro Ijima1, Yuehchun Liao1, Kenri Konno1, Isao Hirano1, Kouichi Misumi1, Dai Shiota1, Katsumi Ohmori1 (1. Tokyo Ohka Kogyo Co., Ltd.(Japan))

High refractive index materials, Zirconia (ZrO2), Titania (TiO2), Imprint lithography, Inkjet

https://doi.org/10.36463/idw.2020.0286

The patternable materials have been improved to be high transparency, high resolution, and adaptable for patterning with photolithography, ink-jet print and imprint. Moreover, combination of high refractive index materials and the patternable technologies led to wider applications for next generation of display industry, such as AR/VR and smart glasses.