Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR

Jiro Hikida

doi:https://doi.org/10.36463/idw.2020.0286

16:10 〜 18:10

[FMCp2-1] Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR

*Jiro Hikida¹, Hiroki Chisaka¹, Yoichiro Ijima¹, Yuehchun Liao¹, Kenri Konno¹, Isao Hirano¹, Kouichi Misumi¹, Dai Shiota¹, Katsumi Ohmori¹ (1. Tokyo Ohka Kogyo Co., Ltd.(Japan))

High refractive index materials, Zirconia (ZrO2), Titania (TiO2), Imprint lithography, Inkjet

https://doi.org/10.36463/idw.2020.0286

The patternable materials have been improved to be high transparency, high resolution, and adaptable for patterning with photolithography, ink-jet print and imprint. Moreover, combination of high refractive index materials and the patternable technologies led to wider applications for next generation of display industry, such as AR/VR and smart glasses.

Proceedings of the International Display Workshops Volume 27 (IDW '20)

[FMCp2-1] Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR