International Display Workshops General Incorporated Association

16:10 〜 18:10

[FMCp3-7] Improvement of the Surface Roughness of LTPS Thin Films with Additional Laser Irradiation

*Fuminobu Hamano1, Akira Mizutani1, Kaname Imokawa1, Daisuke Nakamura1, Tetsuya Goto2, Hiroshi Ikenoue1 (1. Kyushu University(Japan), 2. Tohoku University(Japan))

Low-temperature poly-Si, Thin-film transistors, Excimer-laser annealing, Surface flattening

https://doi.org/10.36463/idw.2020.0322

A well-known major problem in thin-film transistor (TFT) manufacturing is the protrusions that form on low-temperature polysilicon thin films after excimer laser annealing, which, in turn, induce gate leakage current in the TFTs. In this presentation, we report the use of additional laser irradiation to reduce the height of protrusions.